DocumentCode
3552899
Title
Silicone films for insulating layer in multilayer interconnection
Author
Aoe, H. ; Yatsui, Y. ; Hayashida, T.
Author_Institution
Sanyo Electric Research and Development Center, Osaka, Japan
Volume
14
fYear
1968
fDate
1968
Firstpage
84
Lastpage
84
Abstract
The object of this work was to evaluate silicon films crosslinked by electron irradiation as an insulating layer for multilayer interconnections in integrated circuits. It is now possible to make insulating layers of polymer silicones with micron-size patterns by electron beam techniques.
Keywords
Insulation; Nonhomogeneous media; Semiconductor films;
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices Meeting, 1968 International
Type
conf
DOI
10.1109/IEDM.1968.188011
Filename
1475536
Link To Document