DocumentCode :
3553061
Title :
Fabrication of vertical PNP´s NPN´s, and N-channel epitaxial JFET´s in a monolithic substrate
Author :
Beasom, James D.
Author_Institution :
Radiation, Inc., Melbourne, Fla.
Volume :
15
fYear :
1969
fDate :
1969
Firstpage :
84
Lastpage :
84
Abstract :
It is possible to build high performance PNP´s NPN´s, and N-channel epitaxial JFET´s in dielectrically isolated material. The material is double poly type DI, made from P type substrates, into which N+buried layers are diffused in NPN islands. A N type epitaxial layer which is the top layer in the finished material, is deposited on the P substrate.
Keywords :
Fabrication; Substrates;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting, 1969 International
Type :
conf
DOI :
10.1109/IEDM.1969.188141
Filename :
1476022
Link To Document :
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