DocumentCode
3553124
Title
Fabrication of integrated circuits using the electron image projection system (ELIPS)
Author
O´Keeffe, T.W.
Author_Institution
Westinghouse Research Laboratories, Pittsburgh, Pa.
Volume
15
fYear
1969
fDate
1969
Firstpage
148
Lastpage
148
Abstract
ELIPS is based on the use of an electron image tube principle to project large area (2" dia.) ultra high resolution (1 micron) images from a patterned photocathode onto an electron sensitive resist layer thereby replacing the conventional photoresist optical procedures in integrated circuit fabrication (1).
Keywords
Cathodes; Circuit testing; Electron optics; Image resolution; Laboratories; Optical device fabrication; Optical microscopy; Optical sensors; Resists; Scanning electron microscopy;
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices Meeting, 1969 International
Type
conf
DOI
10.1109/IEDM.1969.188199
Filename
1476080
Link To Document