Title :
Fabrication of integrated circuits using the electron image projection system (ELIPS)
Author_Institution :
Westinghouse Research Laboratories, Pittsburgh, Pa.
Abstract :
ELIPS is based on the use of an electron image tube principle to project large area (2" dia.) ultra high resolution (1 micron) images from a patterned photocathode onto an electron sensitive resist layer thereby replacing the conventional photoresist optical procedures in integrated circuit fabrication (1).
Keywords :
Cathodes; Circuit testing; Electron optics; Image resolution; Laboratories; Optical device fabrication; Optical microscopy; Optical sensors; Resists; Scanning electron microscopy;
Conference_Titel :
Electron Devices Meeting, 1969 International
DOI :
10.1109/IEDM.1969.188199
