Title :
High-frequency parameter measurement of monolithic semiconductor devices in wafer form
Author :
Brooksby, M. ; Pering, R. ; Kraska, L.
Abstract :
A technique has been developed for probing monolithic devices before they are diced and scribed at frequencies in excess of 2 GHz. Small- or large-signal device parameters can be measured and enough measurements made on the wafer to obtain statistical information regarding the circuit or device. The advantages of the system are accuracy, speed, repeatability, and traceability. Within minutes after the wafer processing is complete you can know if the units are good or not and also how good.
Keywords :
Ceramics; Circuit testing; Delay; Frequency; Large scale integration; Ohmic contacts; Scattering parameters; Semiconductor device measurement; Semiconductor devices; Voltage;
Conference_Titel :
Electron Devices Meeting, 1970 International
DOI :
10.1109/IEDM.1970.188263