• DocumentCode
    3553212
  • Title

    High-frequency parameter measurement of monolithic semiconductor devices in wafer form

  • Author

    Brooksby, M. ; Pering, R. ; Kraska, L.

  • Volume
    16
  • fYear
    1970
  • fDate
    1970
  • Firstpage
    70
  • Lastpage
    72
  • Abstract
    A technique has been developed for probing monolithic devices before they are diced and scribed at frequencies in excess of 2 GHz. Small- or large-signal device parameters can be measured and enough measurements made on the wafer to obtain statistical information regarding the circuit or device. The advantages of the system are accuracy, speed, repeatability, and traceability. Within minutes after the wafer processing is complete you can know if the units are good or not and also how good.
  • Keywords
    Ceramics; Circuit testing; Delay; Frequency; Large scale integration; Ohmic contacts; Scattering parameters; Semiconductor device measurement; Semiconductor devices; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting, 1970 International
  • Type

    conf

  • DOI
    10.1109/IEDM.1970.188263
  • Filename
    1476375