DocumentCode :
3553212
Title :
High-frequency parameter measurement of monolithic semiconductor devices in wafer form
Author :
Brooksby, M. ; Pering, R. ; Kraska, L.
Volume :
16
fYear :
1970
fDate :
1970
Firstpage :
70
Lastpage :
72
Abstract :
A technique has been developed for probing monolithic devices before they are diced and scribed at frequencies in excess of 2 GHz. Small- or large-signal device parameters can be measured and enough measurements made on the wafer to obtain statistical information regarding the circuit or device. The advantages of the system are accuracy, speed, repeatability, and traceability. Within minutes after the wafer processing is complete you can know if the units are good or not and also how good.
Keywords :
Ceramics; Circuit testing; Delay; Frequency; Large scale integration; Ohmic contacts; Scattering parameters; Semiconductor device measurement; Semiconductor devices; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting, 1970 International
Type :
conf
DOI :
10.1109/IEDM.1970.188263
Filename :
1476375
Link To Document :
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