DocumentCode
3553212
Title
High-frequency parameter measurement of monolithic semiconductor devices in wafer form
Author
Brooksby, M. ; Pering, R. ; Kraska, L.
Volume
16
fYear
1970
fDate
1970
Firstpage
70
Lastpage
72
Abstract
A technique has been developed for probing monolithic devices before they are diced and scribed at frequencies in excess of 2 GHz. Small- or large-signal device parameters can be measured and enough measurements made on the wafer to obtain statistical information regarding the circuit or device. The advantages of the system are accuracy, speed, repeatability, and traceability. Within minutes after the wafer processing is complete you can know if the units are good or not and also how good.
Keywords
Ceramics; Circuit testing; Delay; Frequency; Large scale integration; Ohmic contacts; Scattering parameters; Semiconductor device measurement; Semiconductor devices; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices Meeting, 1970 International
Type
conf
DOI
10.1109/IEDM.1970.188263
Filename
1476375
Link To Document