A technique is described that makes possible the fabrication of p-channel MOS transistors and bipolar transistors within monolithic integrated circuits. Total process compatibility has been achieved without compromising either the n-p-n bipolar or p-channel MOS characteristics, p-channel MOS transistors with

volts, g
m= 1000 µmhos, and

volts for

= 60 and t
ox= 1000 Å have been fabricated with bipolar transistors having

MHz and

V.