DocumentCode
3553216
Title
MOS-Bipolar monolithic integrated circuit technology
Author
Graf, S. ; Polinsky, M.
Author_Institution
RCA, Somerville, N.J.
Volume
16
fYear
1970
fDate
1970
Firstpage
74
Lastpage
74
Abstract
A technique is described that makes possible the fabrication of p-channel MOS transistors and bipolar transistors within monolithic integrated circuits. Total process compatibility has been achieved without compromising either the n-p-n bipolar or p-channel MOS characteristics, p-channel MOS transistors with
volts, gm = 1000 µmhos, and
volts for
= 60 and tox = 1000 Å have been fabricated with bipolar transistors having
MHz and
V.
volts, g
volts for
= 60 and t
MHz and
V.Keywords
Integrated circuit technology; Monolithic integrated circuits;
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices Meeting, 1970 International
Type
conf
DOI
10.1109/IEDM.1970.188267
Filename
1476379
Link To Document