• DocumentCode
    3553216
  • Title

    MOS-Bipolar monolithic integrated circuit technology

  • Author

    Graf, S. ; Polinsky, M.

  • Author_Institution
    RCA, Somerville, N.J.
  • Volume
    16
  • fYear
    1970
  • fDate
    1970
  • Firstpage
    74
  • Lastpage
    74
  • Abstract
    A technique is described that makes possible the fabrication of p-channel MOS transistors and bipolar transistors within monolithic integrated circuits. Total process compatibility has been achieved without compromising either the n-p-n bipolar or p-channel MOS characteristics, p-channel MOS transistors with V_{T} = 1.7 volts, gm= 1000 µmhos, and BV_{DS} = 35 volts for W/L = 60 and tox= 1000 Å have been fabricated with bipolar transistors having B = 100, f_{t} = 500 MHz and BV_{CEO} = 50 V.
  • Keywords
    Integrated circuit technology; Monolithic integrated circuits;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting, 1970 International
  • Type

    conf

  • DOI
    10.1109/IEDM.1970.188267
  • Filename
    1476379