DocumentCode :
3553216
Title :
MOS-Bipolar monolithic integrated circuit technology
Author :
Graf, S. ; Polinsky, M.
Author_Institution :
RCA, Somerville, N.J.
Volume :
16
fYear :
1970
fDate :
1970
Firstpage :
74
Lastpage :
74
Abstract :
A technique is described that makes possible the fabrication of p-channel MOS transistors and bipolar transistors within monolithic integrated circuits. Total process compatibility has been achieved without compromising either the n-p-n bipolar or p-channel MOS characteristics, p-channel MOS transistors with V_{T} = 1.7 volts, gm= 1000 µmhos, and BV_{DS} = 35 volts for W/L = 60 and tox= 1000 Å have been fabricated with bipolar transistors having B = 100, f_{t} = 500 MHz and BV_{CEO} = 50 V.
Keywords :
Integrated circuit technology; Monolithic integrated circuits;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting, 1970 International
Type :
conf
DOI :
10.1109/IEDM.1970.188267
Filename :
1476379
Link To Document :
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