DocumentCode :
3553252
Title :
DSA enhancement - Depletion MOS IC
Author :
Tarui, Y. ; Hayashi, Y. ; Sekigawa, Toshihiro
Author_Institution :
Electrotechnical Laboratory, Tokyo, Japan
fYear :
1970
fDate :
28-30 Oct. 1970
Firstpage :
110
Lastpage :
110
Abstract :
To achieve high-speed and low-power logic, MOS integrated circuits with submicron effective channel length have been constructed. In the diffusion self-aligned structure, the effective channel is determined by the length of impurity side-diffusion. The same diffusion is effectively utilized to make an enhancement-mode MOST for the amplifier and to leave the load MOST in depletion mode. This enhancement-depletion composition has the merits of low supply voltage (down to 1.5 V) and high speed. Furthermore, in this configuration the noise margin to NFBis insensitive to variation of the gate-oxide thickness and has a wide allowance for the surface concentration of the diffused base layer.
Keywords :
Breakdown voltage; Fabrication; Feedback amplifiers; High speed integrated circuits; Integrated circuit noise; Laboratories; Logic circuits; Low voltage; MOS integrated circuits; MOSFETs;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting, 1970 International
Conference_Location :
Washington, DC, USA
Type :
conf
DOI :
10.1109/IEDM.1970.188299
Filename :
1476411
Link To Document :
بازگشت