DocumentCode :
3553256
Title :
Hafnium dioxide capacitors for microwave integrated circuits
Author :
Mitchell, Jerome ; Schnitzler, P.
Volume :
16
fYear :
1970
fDate :
1970
Firstpage :
114
Lastpage :
114
Abstract :
Anodized, sputtered hafnium (hafnium dioxide) produces a high-dielectric-constant (∼40) capacitor that has low electric loss. Measurements to 10,5 GHz on capacitors in the range 6 to 96 pF show good performance as dc blocks and bypass capacitors in actual use. Series resistance at 3 GHz is below 0.3 Ω series inductance is of the order of 50 pHy. Temperature effects, processing techniques, and measurements are described. These capacitors are compatible with standard microwave-integrated-circuit processing techniques used to make both lumped and distributed circuits. The results described were obtained on chip versions of these capacitors.
Keywords :
Capacitors; Electric resistance; Electrical resistance measurement; Hafnium; Inductance; Integrated circuit measurements; Microwave integrated circuits; Microwave theory and techniques; Semiconductor device measurement; Temperature;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting, 1970 International
Type :
conf
DOI :
10.1109/IEDM.1970.188303
Filename :
1476415
Link To Document :
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