• DocumentCode
    3553256
  • Title

    Hafnium dioxide capacitors for microwave integrated circuits

  • Author

    Mitchell, Jerome ; Schnitzler, P.

  • Volume
    16
  • fYear
    1970
  • fDate
    1970
  • Firstpage
    114
  • Lastpage
    114
  • Abstract
    Anodized, sputtered hafnium (hafnium dioxide) produces a high-dielectric-constant (∼40) capacitor that has low electric loss. Measurements to 10,5 GHz on capacitors in the range 6 to 96 pF show good performance as dc blocks and bypass capacitors in actual use. Series resistance at 3 GHz is below 0.3 Ω series inductance is of the order of 50 pHy. Temperature effects, processing techniques, and measurements are described. These capacitors are compatible with standard microwave-integrated-circuit processing techniques used to make both lumped and distributed circuits. The results described were obtained on chip versions of these capacitors.
  • Keywords
    Capacitors; Electric resistance; Electrical resistance measurement; Hafnium; Inductance; Integrated circuit measurements; Microwave integrated circuits; Microwave theory and techniques; Semiconductor device measurement; Temperature;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting, 1970 International
  • Type

    conf

  • DOI
    10.1109/IEDM.1970.188303
  • Filename
    1476415