DocumentCode
3553280
Title
An improved shadow-mask design for in-line three-beam color picture tubes
Author
Naruse, Yuji ; Utsunomiya, Kenji ; Fuse, Y.
Volume
16
fYear
1970
fDate
1970
Firstpage
138
Lastpage
138
Abstract
The in-line arrangement of three electron beams allows much easier convergence than the delta arrangement. However, in a color picture tube with three in-line beams and the conventional shadow mask, the transmission of the shadow mask must be made very low in the corner region to aviod the overlapping of adjacent in-line triplets of beam spots. This overlapping is due to interference between the geometrical tilt pattern of the directions of the in-line triplets landing on a spherical phosphor screen and the rectilinear alignment of apertures of the conventional shadow mask used. The paper presents an improved design of the geometrical aperture alignment, through which the overlappings are prevented throughout the whole screen area, allowing high transmission of the shadow mask with resulting brightness improvement.
Keywords
Apertures; Electron beams; Electron tubes; Feedback; Laboratories; Phosphors; Process control; Signal generators; Signal processing; Strips;
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices Meeting, 1970 International
Type
conf
DOI
10.1109/IEDM.1970.188325
Filename
1476437
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