DocumentCode
3553298
Title
GaAs-Gax Al1-x As electroluminescent heterostructure diodes
Author
Ulmer, E.A., Jr.
Volume
16
fYear
1970
fDate
1970
Firstpage
156
Lastpage
156
Abstract
GaAs(Zn) electroluminescent diodes using a GaAs-Gax Al1-x As heterostructure design with external quantum efficiencies (300°K) of 10%, that 40 milliwatts of continuous output at a current of 1 ampere, have been developed. The heterostructure consists of a Gax Al1-x As(Zn) p-layer grown by liquid-phase epitaxy on an n-type GaAs(Si) substrate (
/cm3) with the simultaneous diffusion of Zn a distance of ∼ 2 µm into the substrate.
/cm3) with the simultaneous diffusion of Zn a distance of ∼ 2 µm into the substrate.Keywords
Bonding; Collision mitigation; Diodes; Electroluminescence; Epitaxial growth; Gallium arsenide; Geometry; Heat sinks; Substrates; Zinc;
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices Meeting, 1970 International
Type
conf
DOI
10.1109/IEDM.1970.188342
Filename
1476454
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