DocumentCode
3553344
Title
Mesa planar Schottky barrier diodes
Author
Ashar, K.G. ; Anantha, N.G.
Author_Institution
IBM Components Division, East Fishkill, N. Y.
Volume
17
fYear
1971
fDate
1971
Firstpage
64
Lastpage
64
Abstract
One of the constraints in the application of Schottky barrier diodes for power, logic, microwave or photodetection has been low reverse breakdown voltage. The breakdown voltage for these diodes is primarily governed by a semicircular shaped electrical fringing field. Guard ring diffusions and/or field plates have been used to increase this voltage. However, both these methods suffer from increased capacitance and increased area requirements. A new fabrication method, the mesa planar structure, has been devised to increase breakdown voltage without an increase in capacitance or area requirements. The process, results and comparison with alternative methods will be described in this presentation.
Keywords
Breakdown voltage; Capacitance; Fabrication; Gallium arsenide; Infrared detectors; Laboratories; Leakage current; Lighting; Schottky barriers; Schottky diodes;
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices Meeting, 1971 International
Type
conf
DOI
10.1109/IEDM.1971.188386
Filename
1476724
Link To Document