• DocumentCode
    3553344
  • Title

    Mesa planar Schottky barrier diodes

  • Author

    Ashar, K.G. ; Anantha, N.G.

  • Author_Institution
    IBM Components Division, East Fishkill, N. Y.
  • Volume
    17
  • fYear
    1971
  • fDate
    1971
  • Firstpage
    64
  • Lastpage
    64
  • Abstract
    One of the constraints in the application of Schottky barrier diodes for power, logic, microwave or photodetection has been low reverse breakdown voltage. The breakdown voltage for these diodes is primarily governed by a semicircular shaped electrical fringing field. Guard ring diffusions and/or field plates have been used to increase this voltage. However, both these methods suffer from increased capacitance and increased area requirements. A new fabrication method, the mesa planar structure, has been devised to increase breakdown voltage without an increase in capacitance or area requirements. The process, results and comparison with alternative methods will be described in this presentation.
  • Keywords
    Breakdown voltage; Capacitance; Fabrication; Gallium arsenide; Infrared detectors; Laboratories; Leakage current; Lighting; Schottky barriers; Schottky diodes;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting, 1971 International
  • Type

    conf

  • DOI
    10.1109/IEDM.1971.188386
  • Filename
    1476724