DocumentCode :
355339
Title :
Relaxation of highly excited surface states of silicon probed by time-resolved optical second-harmonic generation
Author :
Mauerer, M. ; Shumay, I.L. ; Schmitt, G.A. ; Kompa, K.L. ; Hofer, U.
Author_Institution :
Max-Planck-Inst. fur Quantenoptik, Garching bei Munchen, Germany
fYear :
1996
fDate :
7-7 June 1996
Firstpage :
2
Lastpage :
3
Abstract :
Electronic excitation and relaxation processes on semiconductor surfaces have been investigated intensively with time resolved two-photon photoemission. Here, we report the first successful application of surface second-harmonic generation (SHG) for this purpose. The advantage of a purely optical technique is the possibility to extend the experiments to the high excitation regime where strong multi-photon absorption and the build-up of space charges hinder the spectroscopy of photoelectrons.
Keywords :
elemental semiconductors; excited states; optical harmonic generation; photoelectron spectroscopy; photoemission; silicon; surface states; time resolved spectroscopy; two-photon spectra; SHG; Si; electronic excitation; highly excited surface state relaxation; photoelectron spectroscopy; purely optical technique; relaxation processes; semiconductor surfaces; space charge build up; strong multi-photon absorption; surface second-harmonic generation; time resolved two-photon photoemission; time-resolved optical second-harmonic generation; Absorption; Delay; Nonlinear optics; Optical harmonic generation; Optical pumping; Optical surface waves; Polarization; Resonance; Silicon; Stationary state;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Quantum Electronics and Laser Science Conference, 1996. QELS '96., Summaries of Papers Presented at the
Conference_Location :
Anaheim, CA, USA
Print_ISBN :
1-55752-444-0
Type :
conf
Filename :
865487
Link To Document :
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