• DocumentCode
    3553427
  • Title

    Subsurface breakdown devices

  • Author

    Mar, J.

  • Author_Institution
    Bell Telephone Laboratories, Inc., Murray Hill, N. J.
  • Volume
    17
  • fYear
    1971
  • fDate
    1971
  • Firstpage
    152
  • Lastpage
    152
  • Abstract
    In the past, avalanche breakdown has been avoided in junctions for which there are requirements for stable low reverse bias leakage and/or stable minority carrier lifetime, It is well known that breaking down the emitter-base junction of a conventional planar bipolar transistor leads to a reduction of current gain and an increase in junction leakage. Recent studies all indicate that such degradation is due to the creation of interface states at the Si-SiO2interface and that degradation can be avoided if the breakdown is forced to occur away from the interface.
  • Keywords
    Avalanche breakdown; Bipolar transistors; Breakdown voltage; Charge carrier lifetime; Degradation; Electric breakdown; Laboratories; Leakage current; P-n junctions; TV;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting, 1971 International
  • Type

    conf

  • DOI
    10.1109/IEDM.1971.188462
  • Filename
    1476800