DocumentCode :
3553427
Title :
Subsurface breakdown devices
Author :
Mar, J.
Author_Institution :
Bell Telephone Laboratories, Inc., Murray Hill, N. J.
Volume :
17
fYear :
1971
fDate :
1971
Firstpage :
152
Lastpage :
152
Abstract :
In the past, avalanche breakdown has been avoided in junctions for which there are requirements for stable low reverse bias leakage and/or stable minority carrier lifetime, It is well known that breaking down the emitter-base junction of a conventional planar bipolar transistor leads to a reduction of current gain and an increase in junction leakage. Recent studies all indicate that such degradation is due to the creation of interface states at the Si-SiO2interface and that degradation can be avoided if the breakdown is forced to occur away from the interface.
Keywords :
Avalanche breakdown; Bipolar transistors; Breakdown voltage; Charge carrier lifetime; Degradation; Electric breakdown; Laboratories; Leakage current; P-n junctions; TV;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting, 1971 International
Type :
conf
DOI :
10.1109/IEDM.1971.188462
Filename :
1476800
Link To Document :
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