• DocumentCode
    3553483
  • Title

    A new low-noise bipolar C-band transistor

  • Author

    Ch´en, D.R.

  • Volume
    18
  • fYear
    1972
  • fDate
    1972
  • Firstpage
    36
  • Lastpage
    36
  • Abstract
    Computer designing techniques and novel processing were used to develop an experimental, high performance microwave transistor which is useful as a low-noise amplifier in both the S-band and the C-band. The transistor, L-216C, is a double diffused, NPN silicon transistor made by a special planar process without the aid of electron beam lithography or ion implantation. The transistor has a measured fmaxof 30 GHz, and it has achieved a noise figure of 3.0 dB at 4 GHz and 4.2 dB at 6 GHz. The maximum available gain at 4 GHz and 6 GHz are 11.5 dB and 8.0 dB respectively.
  • Keywords
    Electron beams; High performance computing; Ion implantation; Lithography; Low-noise amplifiers; Microwave theory and techniques; Microwave transistors; Noise figure; Noise measurement; Silicon;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting, 1972 International
  • Type

    conf

  • DOI
    10.1109/IEDM.1972.249261
  • Filename
    1477090