DocumentCode
3553483
Title
A new low-noise bipolar C-band transistor
Author
Ch´en, D.R.
Volume
18
fYear
1972
fDate
1972
Firstpage
36
Lastpage
36
Abstract
Computer designing techniques and novel processing were used to develop an experimental, high performance microwave transistor which is useful as a low-noise amplifier in both the S-band and the C-band. The transistor, L-216C, is a double diffused, NPN silicon transistor made by a special planar process without the aid of electron beam lithography or ion implantation. The transistor has a measured fmax of 30 GHz, and it has achieved a noise figure of 3.0 dB at 4 GHz and 4.2 dB at 6 GHz. The maximum available gain at 4 GHz and 6 GHz are 11.5 dB and 8.0 dB respectively.
Keywords
Electron beams; High performance computing; Ion implantation; Lithography; Low-noise amplifiers; Microwave theory and techniques; Microwave transistors; Noise figure; Noise measurement; Silicon;
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices Meeting, 1972 International
Type
conf
DOI
10.1109/IEDM.1972.249261
Filename
1477090
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