Title :
Near-field distribution measured by photochemical processes on conjugated polymers
Author :
Wei, P.K. ; Hsu, J.H. ; Hsieh, B.R.
Author_Institution :
Inst. of Atomic & Molecular Sci., Acad. Sinica, Taipei, Taiwan
Abstract :
In near-field scanning optical microscopy (NSOM), understanding the near-field distribution is important for the interpretation of the images. In this paper, we present a new method to measure the two-dimensional intensity distribution by use of photochemical reactions.
Keywords :
chemical reactions; image processing; optical microscopy; optical polymers; photochemistry; NSOM; conjugated polymers; near-field distribution; near-field distribution measurement; near-field scanning optical microscopy; optical microscope image processing; photochemical processes; photochemical reactions; two-dimensional intensity distribution; Atomic measurements; Electromagnetic wave absorption; Gratings; Optical fiber polarization; Optical microscopy; Optical polymers; Oxidation; Photochemistry; Probes; Surface topography;
Conference_Titel :
Quantum Electronics and Laser Science Conference, 1996. QELS '96., Summaries of Papers Presented at the
Conference_Location :
Anaheim, CA, USA
Print_ISBN :
1-55752-444-0
