DocumentCode :
3553706
Title :
A process for simultaneous fabrication of vertical NPN and PNP´s Nch, and Pch MOS devices
Author :
Beasom, J.D.
Author_Institution :
Harris Semiconductor, Melbourne, Florida
Volume :
19
fYear :
1973
fDate :
1973
Firstpage :
41
Lastpage :
43
Keywords :
Fabrication; Frequency; Immune system; Impedance; Linear circuits; Logic functions; MOS devices; Power dissipation; Signal design; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting, 1973 International
Type :
conf
DOI :
10.1109/IEDM.1973.188643
Filename :
1477520
Link To Document :
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