Title :
Implanted resistors with properties enhanced by damage
Author :
Nicholas, K.H. ; Ford, R.A.
Author_Institution :
Mullard Research Laboratories, Redhill, Surrey, England
Keywords :
Annealing; Circuits; Doping; Hall effect; Implants; Inverters; Ion implantation; Laboratories; Resistors; Temperature;
Conference_Titel :
Electron Devices Meeting, 1973 International
DOI :
10.1109/IEDM.1973.188646
