Title :
Beam acceptance of silicon silicon-dioxide memory tubes
Author_Institution :
Philips Research Laboratories, Eindhoven-The Netherlands
Keywords :
Cathodes; Electrons; Equations; Insulation; Laboratories; Periodic structures; Rough surfaces; Silicon; Surface roughness; Voltage;
Conference_Titel :
Electron Devices Meeting, 1973 International
DOI :
10.1109/IEDM.1973.188714