DocumentCode :
3553784
Title :
Beam acceptance of silicon silicon-dioxide memory tubes
Author :
Carasso, M.G.
Author_Institution :
Philips Research Laboratories, Eindhoven-The Netherlands
Volume :
19
fYear :
1973
fDate :
1973
Firstpage :
301
Lastpage :
303
Keywords :
Cathodes; Electrons; Equations; Insulation; Laboratories; Periodic structures; Rough surfaces; Silicon; Surface roughness; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting, 1973 International
Type :
conf
DOI :
10.1109/IEDM.1973.188714
Filename :
1477591
Link To Document :
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