DocumentCode
3553837
Title
Fabrication and operation of CCD structure with silicon layers grown on sapphire substrates
Author
Chan, Y.T.
Author_Institution
Rockwell International, Anaheim, CA
Volume
19
fYear
1973
fDate
1973
Firstpage
469
Lastpage
472
Abstract
Two CCD´s, one 2 bits long and one 64 bits long, were fabricated from silicon on sapphire wafers. The 2-bit device is a resistive gate structure which can be operated ten times faster (2 MHz) than the normal structure of the same size. The reason is found to be due to the special structure of the resistive gate structure. The 64-bit device is processed on bulk silicon so that a direct comparison can be made. Both SOS and bulk silicon can be operated at 20 MHz or higher. At high-frequency operation, both devices have about the same transfer efficiency. But at the low-frequency end, the SOS device shows the dark current to be very high with the device barely operating at 600 KHz.
Keywords
Charge coupled devices; Charge transfer; Current measurement; Diodes; Fabrication; Frequency; MOS capacitors; Silicon; Substrates; Testing;
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices Meeting, 1973 International
Type
conf
DOI
10.1109/IEDM.1973.188762
Filename
1477639
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