• DocumentCode
    3553837
  • Title

    Fabrication and operation of CCD structure with silicon layers grown on sapphire substrates

  • Author

    Chan, Y.T.

  • Author_Institution
    Rockwell International, Anaheim, CA
  • Volume
    19
  • fYear
    1973
  • fDate
    1973
  • Firstpage
    469
  • Lastpage
    472
  • Abstract
    Two CCD´s, one 2 bits long and one 64 bits long, were fabricated from silicon on sapphire wafers. The 2-bit device is a resistive gate structure which can be operated ten times faster (2 MHz) than the normal structure of the same size. The reason is found to be due to the special structure of the resistive gate structure. The 64-bit device is processed on bulk silicon so that a direct comparison can be made. Both SOS and bulk silicon can be operated at 20 MHz or higher. At high-frequency operation, both devices have about the same transfer efficiency. But at the low-frequency end, the SOS device shows the dark current to be very high with the device barely operating at 600 KHz.
  • Keywords
    Charge coupled devices; Charge transfer; Current measurement; Diodes; Fabrication; Frequency; MOS capacitors; Silicon; Substrates; Testing;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting, 1973 International
  • Type

    conf

  • DOI
    10.1109/IEDM.1973.188762
  • Filename
    1477639