DocumentCode :
3553837
Title :
Fabrication and operation of CCD structure with silicon layers grown on sapphire substrates
Author :
Chan, Y.T.
Author_Institution :
Rockwell International, Anaheim, CA
Volume :
19
fYear :
1973
fDate :
1973
Firstpage :
469
Lastpage :
472
Abstract :
Two CCD´s, one 2 bits long and one 64 bits long, were fabricated from silicon on sapphire wafers. The 2-bit device is a resistive gate structure which can be operated ten times faster (2 MHz) than the normal structure of the same size. The reason is found to be due to the special structure of the resistive gate structure. The 64-bit device is processed on bulk silicon so that a direct comparison can be made. Both SOS and bulk silicon can be operated at 20 MHz or higher. At high-frequency operation, both devices have about the same transfer efficiency. But at the low-frequency end, the SOS device shows the dark current to be very high with the device barely operating at 600 KHz.
Keywords :
Charge coupled devices; Charge transfer; Current measurement; Diodes; Fabrication; Frequency; MOS capacitors; Silicon; Substrates; Testing;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting, 1973 International
Type :
conf
DOI :
10.1109/IEDM.1973.188762
Filename :
1477639
Link To Document :
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