DocumentCode :
3553969
Title :
Isolation of junction devices in GaAs1-xPxusing electron bombardment
Author :
Wada, Takao ; Uemura, Sashiro
Author_Institution :
Mie University, Mie, Japan
Volume :
21
fYear :
1975
fDate :
1975
Firstpage :
192
Lastpage :
195
Abstract :
High energy electron bombardment produces high resistivity layers in n-type GaAsP. The resistivity of the specimen varied from \\sim 0.2 \\Omega -cm to \\sim 10^{6} \\Omega -cm by the irradiation of \\sim 1.2 \\times 10^{16} electrons./ cm2at 7MeV. The light-emitting diodes (LED\´s) irradiated in this condition did not exhibit the any optical radiation. It will be shown that this new technique is useful for isolating GaAsP junction devices.
Keywords :
Conductivity; Electroluminescence; Electron beams; Electron optics; Etching; Gallium arsenide; Laboratories; Light emitting diodes; Optical materials; Substrates;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting, 1975 International
Type :
conf
DOI :
10.1109/IEDM.1975.188856
Filename :
1478217
Link To Document :
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