• DocumentCode
    3553977
  • Title

    Variables which influence silicon Schottky solar cell performance

  • Author

    Anderson, W.A. ; Vernon, S.M. ; Delahoy, A.E. ; Ng, K.K. ; Mathe, P. ; Poon, T.

  • Author_Institution
    Rutgers University, New Brunswick, NJ
  • Volume
    21
  • fYear
    1975
  • fDate
    1975
  • Firstpage
    217
  • Lastpage
    220
  • Abstract
    Individual processing steps have been varied to determine the effect on Schottky barrier solar cell (SBSC) performance. A Si. wafer produces a better fill factor and current than does Si. Silicon resistivity of 0.4 or 2 Ω-cm results in comparable cells. Sputter deposition of the metal causes the metal atoms to penetrate the silicon which produces a lower voltage as a result of a reduced barrier height. I-V data suggest the presence of a tunneling component in the current. This is verified by an activation energy plot. A better understanding of these current mechanisms should lead to improved solar cell efficiency.
  • Keywords
    Chromium; Conductivity; Etching; Fabrication; Lighting; Photovoltaic cells; Schottky barriers; Silicon; Sputtering; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting, 1975 International
  • Type

    conf

  • DOI
    10.1109/IEDM.1975.188863
  • Filename
    1478224