DocumentCode
3554009
Title
Epitaxial silicon solar cells
Author
D´Aiello, R.V. ; Robinson, P.H. ; Kressel, H.
Author_Institution
RCA Laboratories, Princeton, New Jersey
Volume
21
fYear
1975
fDate
1975
Firstpage
335
Lastpage
338
Abstract
Epitaxial silicon solar cell structures have been grown on both single crystal, as well as polycrystalline EFG "ribbon" substrates. Using EFG substrates, a comparison is made of the material, and electrical characteristics of solar cells fabricated from grown epitaxial junctions and those formed by direct diffusion into the ribbon. Efficiencies of 10% (AM-1) have been achieved with the epitaxial structures, which are substantially higher than achieved by diffusion. The improvement is shown to result mainly from the lower saturation current density of the epitaxial junctions. Epitaxial single crystal P+/P/N/N+solar cell structures containing intentionally graded N-base regions were also studied. Near ideal I-V characteristics were obtained with an open circuit voltage of 636 mv, fill factor of 0.79 and AM-1 efficiency of 12.6%.
Keywords
Costs; Crystalline materials; Crystallization; Current-voltage characteristics; Etching; Fabrication; Inductors; Photovoltaic cells; Silicon; Substrates;
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices Meeting, 1975 International
Type
conf
DOI
10.1109/IEDM.1975.188892
Filename
1478253
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