• DocumentCode
    3554009
  • Title

    Epitaxial silicon solar cells

  • Author

    D´Aiello, R.V. ; Robinson, P.H. ; Kressel, H.

  • Author_Institution
    RCA Laboratories, Princeton, New Jersey
  • Volume
    21
  • fYear
    1975
  • fDate
    1975
  • Firstpage
    335
  • Lastpage
    338
  • Abstract
    Epitaxial silicon solar cell structures have been grown on both single crystal, as well as polycrystalline EFG "ribbon" substrates. Using EFG substrates, a comparison is made of the material, and electrical characteristics of solar cells fabricated from grown epitaxial junctions and those formed by direct diffusion into the ribbon. Efficiencies of 10% (AM-1) have been achieved with the epitaxial structures, which are substantially higher than achieved by diffusion. The improvement is shown to result mainly from the lower saturation current density of the epitaxial junctions. Epitaxial single crystal P+/P/N/N+solar cell structures containing intentionally graded N-base regions were also studied. Near ideal I-V characteristics were obtained with an open circuit voltage of 636 mv, fill factor of 0.79 and AM-1 efficiency of 12.6%.
  • Keywords
    Costs; Crystalline materials; Crystallization; Current-voltage characteristics; Etching; Fabrication; Inductors; Photovoltaic cells; Silicon; Substrates;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting, 1975 International
  • Type

    conf

  • DOI
    10.1109/IEDM.1975.188892
  • Filename
    1478253