DocumentCode :
3554043
Title :
Fabrication of a ferroelectric gate memory transistor
Author :
Park, J.K. ; Grannemann, W.W.
Author_Institution :
University of New Mexico, Albuquerque, New Mexico
Volume :
21
fYear :
1975
fDate :
1975
Firstpage :
463
Lastpage :
465
Abstract :
Transistors were fabricated using a sputtered barium titanate dielectric for the gate insulator. The insulator shows two polarization states. It is possible to have normal field effect transistor characteristics in one state and the transistor turned off in the other state. These transistors may be useful in memory applications.
Keywords :
Atmosphere; Barium; Capacitance; Dielectrics and electrical insulation; FETs; Fabrication; Ferroelectric materials; Polarization; Silicon; Titanium compounds;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting, 1975 International
Type :
conf
DOI :
10.1109/IEDM.1975.188923
Filename :
1478284
Link To Document :
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