Title :
Fabrication of a ferroelectric gate memory transistor
Author :
Park, J.K. ; Grannemann, W.W.
Author_Institution :
University of New Mexico, Albuquerque, New Mexico
Abstract :
Transistors were fabricated using a sputtered barium titanate dielectric for the gate insulator. The insulator shows two polarization states. It is possible to have normal field effect transistor characteristics in one state and the transistor turned off in the other state. These transistors may be useful in memory applications.
Keywords :
Atmosphere; Barium; Capacitance; Dielectrics and electrical insulation; FETs; Fabrication; Ferroelectric materials; Polarization; Silicon; Titanium compounds;
Conference_Titel :
Electron Devices Meeting, 1975 International
DOI :
10.1109/IEDM.1975.188923