DocumentCode :
3554090
Title :
Hydrogen sensitive MOS structures
Author :
Lundström, I. ; Shivaraman, M.S. ; Svensson, C.
Author_Institution :
Chalmers University of Technology, Gothenburg, Sweden
Volume :
21
fYear :
1975
fDate :
1975
Firstpage :
631
Lastpage :
634
Abstract :
It is shown that hydrogen in the ambient atmosphere changes the flatband voltage of palladium gate MOS-structures. The physical mechanisms behind this phenomenon are discussed. Experimental results on the detection of hydrogen in air, argon and nitrogen are given. It is shown that the rate constants of chemical reactions on the Pd-surface are obtained from such experiments. The detection of hydrogen in hydrogen compounds like ammonia and of hydrogen in smoke is also demonstrated. Internal photoemission experiments, which support the results on the flatband voltage changes of MOS-structures, are briefly discussed.
Keywords :
Argon; Atomic layer deposition; Capacitors; Chemicals; Equations; Hydrogen; Laboratories; Photoelectricity; Temperature distribution; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting, 1975 International
Type :
conf
DOI :
10.1109/IEDM.1975.188966
Filename :
1478327
Link To Document :
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