DocumentCode
3554161
Title
Operation and characterization of N-channel EPROM cells
Author
Barnes, J. ; Linden, J. ; Edwards, J.
Author_Institution
American Micro-Systems, Inc., Santa Clara, California
Volume
22
fYear
1976
fDate
1976
Firstpage
173
Lastpage
176
Abstract
This paper describes the operation and characterization of an N-channel, double-polysilicon gate MOS structure used in an electrically programmable read-only memory (EPROM). The tradeoffs for various structures with regard to writing ability, reading ability, fabrication complexity and ease of erasure are discussed. Measurements of the device are compared to the associated theory, and the sensitivity of the structure to various device parameters is described.
Keywords
Doping; EPROM; Fabrication; Performance evaluation; Product development; Pulse measurements; Size control; Testing; Threshold voltage; Writing;
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices Meeting, 1976 International
Type
conf
DOI
10.1109/IEDM.1976.189011
Filename
1478723
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