DocumentCode
3554165
Title
C2L: A new high speed, high density bulk CMOS technology
Author
Dingwall, Andrew G F ; Stricker, Roger E.
Author_Institution
RCA Solid-State Technology Center, Somerville, N.J.
Volume
22
fYear
1976
fDate
1976
Firstpage
188
Lastpage
191
Abstract
A new structural approach to high speed COS/MOS, C2L, results in significant speed and packing density gains. The CDP 1802, single-chip, 8-bit microprocessor as well as several memory and I/O circuits announced recently by the RCA Solid State Division are fabricated in this new bulk CMOS technology, called C2L or Closed COS/MOS Logic. C2L is a self-aligned silicon gate CMOS technology where the gate completely surrounds the drain. This technique does not require the conventional guardbands of standard Al-gate CMOS and thereby significantly increases packing density as well as device speed, and still retains the inherent advantages of CMOS (very low static power dissipation, high noise immunity and operating voltage from 3 to 15 volts at temperatures ranging from -55°C to 125°C). The basic C2L device structure is presented and compared to standard Al-gate CMOS. The speed advantages of C2L devices are discussed, and data comparing the performance of C2L circuits with comparable standard CMOS devices is presented. Generally, C2L devices show an improvement in packing density by a factor of 3 over standard CMOS and operate at frequencies approximately 4 to 6 times faster than standard CMOS. The fabrication sequence for C2L devices requires 6 photomasks (one less than standard CMOS).
Keywords
CMOS logic circuits; CMOS memory circuits; CMOS technology; Logic devices; Microprocessors; Power dissipation; Silicon; Solid state circuits; Temperature distribution; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices Meeting, 1976 International
Type
conf
DOI
10.1109/IEDM.1976.189015
Filename
1478727
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