Title :
Surface reaction and desorption probed by femtosecond second harmonic generation: Cl etching of Si(111) surface
Author :
Sasaki, F. ; Haraichi, S. ; Kobayashi, S. ; Tani, Tomoyuki ; Komuro, M.
Author_Institution :
Electrotech. Lab., Tsukuba, Japan
Abstract :
Summary form only given. To study surface science because of its surface sensitivity, nondetrimental and in situ observation, and the ultrafast response we use femtosecond time-resolved studies of the desorption and/or reaction on the semiconductor surfaces have been carried out. We report the results of the laser-induced surface reaction and/or desorption on the Si(111)/Cl/sub 2/ system by use of the femtosecond second harmonic generation.
Keywords :
chemical reactions; desorption; etching; high-speed optical techniques; laser beam effects; optical harmonic generation; silicon; surface phenomena; Cl; Cl etching; Cl/sub 2/; Si; Si(111) surface; Si(111)/Cl/sub 2/ system; desorption; femtosecond second harmonic generation; femtosecond time-resolved studies; in situ observation; laser-induced surface reaction; semiconductor surface reaction; surface desorption; surface reaction; surface science; surface sensitivity; ultrafast response; Etching; Frequency conversion; Nonlinear optics; Optical harmonic generation; Optical pumping; Optical sensors; Optical surface waves; Probes; Ultrafast electronics; Ultrafast optics;
Conference_Titel :
Quantum Electronics and Laser Science Conference, 1996. QELS '96., Summaries of Papers Presented at the
Conference_Location :
Anaheim, CA, USA
Print_ISBN :
1-55752-444-0
