• DocumentCode
    3554226
  • Title

    Epitaxial silicon n+-p- π -p+avalanche photodiodes for optical fiber communications at 800 to 900 nanometers

  • Author

    Melchior, H. ; Hartman, A.R.

  • Author_Institution
    Bell Laboratories, Murray Hill, New Jersey
  • fYear
    1976
  • fDate
    6-8 Dec. 1976
  • Firstpage
    412
  • Lastpage
    415
  • Abstract
    Silicon n+-p-π-p+avalanche photodiodes, having high speed (1 ns response time), low noise and high current gain, have been developed for optical fiber communications. These detectors provide a 16 dB improvement in sensitivity over nonavalanching photodiodes in optical receivers operating at 825 nm and 44.7 Mbit/sec. To facilitate fabrication on large diameter wafers, achieve uniform avalanche gain, and obtain quantum efficiencies greater than 90% at 800 to 850 nm, the avalanche photodiodes are constructed from 50 µm thick, high resistivity epitaxial silicon. At an average gain of 100, their resulting excess noise factor is only 4 to 6 times the shot noise limit. Low dark currents and good reliability are achieved through the use of guard rings, channel stops, bulk and surface gettering, dielectric passivation and surface field plates.
  • Keywords
    Avalanche photodiodes; Conductivity; Dark current; Delay; Gettering; Optical device fabrication; Optical fiber communication; Optical noise; Optical receivers; Silicon;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting, 1976 International
  • Conference_Location
    Washigton, DC, USA
  • Type

    conf

  • DOI
    10.1109/IEDM.1976.189070
  • Filename
    1478782