Title :
A high-throughput scanning-electron-beam lithography system, EL1, for semiconductor manufacture: General description
Author :
Yourke, H.S. ; Weber, E.V.
Author_Institution :
IBM System Products Division, East Fishkill, Hopewell Junction, New York
Keywords :
Error correction; Fabrication; Impedance; Lighting control; Lithography; Microscopy; Production systems; Semiconductor device manufacture; Throughput; Writing;
Conference_Titel :
Electron Devices Meeting, 1976 International
DOI :
10.1109/IEDM.1976.189075
