DocumentCode
3554230
Title
A high-throughput scanning-electron-beam lithography system, EL1, for semiconductor manufacture: General description
Author
Yourke, H.S. ; Weber, E.V.
Author_Institution
IBM System Products Division, East Fishkill, Hopewell Junction, New York
Volume
22
fYear
1976
fDate
1976
Firstpage
431
Lastpage
433
Keywords
Error correction; Fabrication; Impedance; Lighting control; Lithography; Microscopy; Production systems; Semiconductor device manufacture; Throughput; Writing;
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices Meeting, 1976 International
Type
conf
DOI
10.1109/IEDM.1976.189075
Filename
1478787
Link To Document