Title :
Electron optics of the electron-beam lithography system, EL1
Author :
Mauer, J.L. ; Pfeiffer, H.C. ; Stickel, W.
Author_Institution :
IBM System Products Division, East Fishkill, Hopewell Junction, New York
Keywords :
Apertures; Coils; Electron beams; Electron optics; Focusing; Laboratories; Lenses; Lithography; Magnetic shielding; Probes;
Conference_Titel :
Electron Devices Meeting, 1976 International
DOI :
10.1109/IEDM.1976.189076
