Title :
Correction of field distortion in the electron-beam lithography system, EL1
Author :
Loughran, J.F. ; Michail, M.S. ; Ryan, P.M. ; Engelke, H.
Author_Institution :
IBM System Products Division, East Fishkill, Hopewell Junction, New York
Keywords :
Calibration; Clocks; Computer errors; Distortion measurement; Error correction; Lithography; Low-frequency noise; Noise measurement; Semiconductor device manufacture; Writing;
Conference_Titel :
Electron Devices Meeting, 1976 International
Conference_Location :
Washigton, DC, USA
DOI :
10.1109/IEDM.1976.189077
