Double ion implanted DSAMOS-bipolar devices

The new DSAMOS-bipolar compatible devices have been developed by utilizing the high transcoductance / input impedance of DSA MOS transistor and driving capability of bipolar one for large current. In the double diffused technology, dopants were deposited by the ion implanting method, which resulted in the better threshold voltage controllability (ΔV/Vth=0.05) for DSA MOSFET and high current gain (β=800) for npn transistor. High transconductance of 1.3 mΩ3 was obtained with small size transistor (W =300 µm). The optimum value of base dose was determined by the relationship between Vth and ρsb (base sheet resistance for analogue circuit use.