DocumentCode :
3554420
Title :
Computer analysis of resistance and non-uniform illumination effects on concentrator solar cells
Author :
Mitchell, Kim W.
Author_Institution :
Sandia Laboratories, Albuquerque, NM
Volume :
23
fYear :
1977
fDate :
1977
Firstpage :
229
Lastpage :
232
Abstract :
A computer program has been developed to perform a two-dimensional matrix analysis of the voltage distribution in the top layer of concentrator solar cells in order to evaluate the important effects of top layer sheet resistance, contact grid geometry, and non-uniform illumination. The uniformity of illumination influences the cell efficiency through modifying the resistance losses in the cells. It is shown that introduction of lower top layer resistance (∼ 5 ohms/square) reduces the sensitivity of cell performance to illumination uniformity, which suggests important economic benefits for concentrator systems: reduced power loss (higher conversion efficiency) in solar cells at higher concentrations, and relaxed tolerances on illumination uniformity (lower concentrator cost).
Keywords :
Computational geometry; Contact resistance; Distributed computing; Grid computing; Lighting; Performance analysis; Performance evaluation; Performance loss; Photovoltaic cells; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting, 1977 International
Type :
conf
DOI :
10.1109/IEDM.1977.189214
Filename :
1479294
Link To Document :
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