• DocumentCode
    3554483
  • Title

    Intrachip and spatial parametric integrity an important part of IC process characterization

  • Author

    Ham, W.E.

  • Author_Institution
    RCA Laboratories, Princeton, NJ
  • Volume
    23
  • fYear
    1977
  • fDate
    1977
  • Firstpage
    406
  • Lastpage
    409
  • Abstract
    This work demonstrates the power and use of closely spaced nominally identical test devices as I.C. Process characterization tools.
  • Keywords
    Circuit testing; Contact resistance; Integrated circuit testing; Interpolation; MOS capacitors; NIST; Sampling methods; Silicon; Vehicles; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting, 1977 International
  • Type

    conf

  • DOI
    10.1109/IEDM.1977.189272
  • Filename
    1479352
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=3554483