DocumentCode
3554512
Title
Lifetime control by palladium diffusion in silicon
Author
So, Lingkon ; Whiteley, J. Stanley ; Ghandhi, Sorab K. ; Baliga, B.Jayant
Author_Institution
General Electric Company, Auburn, New York
Volume
23
fYear
1977
fDate
1977
Firstpage
494
Lastpage
497
Abstract
This paper will discuss the use of palladium for the control of lifetime in silicon power devices. It is shown that palladium has the advantage over platinum of lower solubility (by a factor of 20-50). As a result, greater process control can be achieved for lifetimes in the range that is desireable for power rectifiers and thyristors (0.1 to 1 µsec). Experiments, conducted on diodes made with both p- and n-type silicon, are used to establish the dominant lifetime controlling level in each case, together with its capture parameters. Finally, an assessment is made of the advantages and disadvantages of palladium doping for semiconductor power devices.
Keywords
Electrons; Gold; Leakage current; Palladium; Platinum; Radiative recombination; Semiconductor device doping; Semiconductor diodes; Silicon; Thyristors;
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices Meeting, 1977 International
Type
conf
DOI
10.1109/IEDM.1977.189299
Filename
1479379
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