• DocumentCode
    3554595
  • Title

    Diffusion current effects in DMOS transistors

  • Author

    Harper, D.H. ; Thomas, R.E.

  • Author_Institution
    Carleton University, Ottawa, Canada
  • Volume
    24
  • fYear
    1978
  • fDate
    1978
  • Firstpage
    34
  • Lastpage
    37
  • Abstract
    To show the effects of a non-constant impurity profile along the channel of a MOST, a simple numerical model has been developed. The analysis is applied to a DMOST intended for low voltage digital applications. The model accounts for the variation in flat band voltage, substrate potential, and surface mobility along the channel. Results show that diffusion current plays a significant role especially in the ´short channel´ mode of DMOST operation. This in part explains why unrealistic parameter values must often be assigned to existing DMOST models to obtain agreement with experimental results.
  • Keywords
    Circuits; Doping; Impurities; Low voltage; MOSFETs; Mathematics; Numerical simulation; Resistors; Semiconductor process modeling; Threshold voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting, 1978 International
  • Type

    conf

  • DOI
    10.1109/IEDM.1978.189345
  • Filename
    1479770