DocumentCode :
3554595
Title :
Diffusion current effects in DMOS transistors
Author :
Harper, D.H. ; Thomas, R.E.
Author_Institution :
Carleton University, Ottawa, Canada
Volume :
24
fYear :
1978
fDate :
1978
Firstpage :
34
Lastpage :
37
Abstract :
To show the effects of a non-constant impurity profile along the channel of a MOST, a simple numerical model has been developed. The analysis is applied to a DMOST intended for low voltage digital applications. The model accounts for the variation in flat band voltage, substrate potential, and surface mobility along the channel. Results show that diffusion current plays a significant role especially in the ´short channel´ mode of DMOST operation. This in part explains why unrealistic parameter values must often be assigned to existing DMOST models to obtain agreement with experimental results.
Keywords :
Circuits; Doping; Impurities; Low voltage; MOSFETs; Mathematics; Numerical simulation; Resistors; Semiconductor process modeling; Threshold voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting, 1978 International
Type :
conf
DOI :
10.1109/IEDM.1978.189345
Filename :
1479770
Link To Document :
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