DocumentCode :
3554714
Title :
Model and performance of hot-electron MOS transistors for high-speed, low power LSI
Author :
Hoefflinger, B. ; Sibbert, H. ; Zimmer, G. ; Kubalek, E. ; Menzel, E.
Author_Institution :
Universität Dortmund, W. Germany
Volume :
24
fYear :
1978
fDate :
1978
Firstpage :
463
Lastpage :
467
Abstract :
An analytical model is presented for a MOS transistor, whose channel length L is so short that the product of L and the hot-electron critical field ECis smaller than the operating voltages. Static and dynamic charateristics are tested, in particular by using an SEM in the stroboscopic voltage contrast mode. Simple expressions for transconductance, output resistance, available voltage gain, input capacitance, supply and threshold voltage, noise margins, power and delay allow quantitative scaling into the submicron regime.
Keywords :
Analytical models; Capacitance; Circuit testing; Delay; Dynamic voltage scaling; Electrons; Large scale integration; MOSFETs; Numerical analysis; Threshold voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting, 1978 International
Type :
conf
DOI :
10.1109/IEDM.1978.189455
Filename :
1479880
Link To Document :
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