Title :
Model and performance of hot-electron MOS transistors for high-speed, low power LSI
Author :
Hoefflinger, B. ; Sibbert, H. ; Zimmer, G. ; Kubalek, E. ; Menzel, E.
Author_Institution :
Universität Dortmund, W. Germany
Abstract :
An analytical model is presented for a MOS transistor, whose channel length L is so short that the product of L and the hot-electron critical field ECis smaller than the operating voltages. Static and dynamic charateristics are tested, in particular by using an SEM in the stroboscopic voltage contrast mode. Simple expressions for transconductance, output resistance, available voltage gain, input capacitance, supply and threshold voltage, noise margins, power and delay allow quantitative scaling into the submicron regime.
Keywords :
Analytical models; Capacitance; Circuit testing; Delay; Dynamic voltage scaling; Electrons; Large scale integration; MOSFETs; Numerical analysis; Threshold voltage;
Conference_Titel :
Electron Devices Meeting, 1978 International
DOI :
10.1109/IEDM.1978.189455