DocumentCode :
3554762
Title :
Isolation of GaP LED using electron irradiation II
Author :
Wada, T. ; Uemura, S. ; Kakehi, M. ; Kitamura, N.
Author_Institution :
Mie University, Tsu, Japan
Volume :
24
fYear :
1978
fDate :
1978
Firstpage :
638
Lastpage :
641
Abstract :
The resistivity of GaP crystal changed from ∼0.5Ω-cm to ∼109Ω-cm and an original orange colour of the crystal varied to black by 1∼7 MeV electron irradiation. It is useful for isolating GaP junction devices. In the present paper, the spatial distributions of red luminescence in a linelike region irradiated by scanned electron beam with ∼32µm width were investigated using a scanning electron microscope (SEM). Also the annealing behavior and the electron energy dependence of the two-dimensional distribution profiles of damage defect density in GaP were obtained experimentally by using a microdensitometer and the theoretical profiles were estimated by a Monte Carlo simulation.
Keywords :
Annealing; Conductivity; Electron beams; Electron optics; Light emitting diodes; Monte Carlo methods; Optical films; Scanning electron microscopy; Temperature; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting, 1978 International
Type :
conf
DOI :
10.1109/IEDM.1978.189499
Filename :
1479924
Link To Document :
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