DocumentCode
3554762
Title
Isolation of GaP LED using electron irradiation II
Author
Wada, T. ; Uemura, S. ; Kakehi, M. ; Kitamura, N.
Author_Institution
Mie University, Tsu, Japan
Volume
24
fYear
1978
fDate
1978
Firstpage
638
Lastpage
641
Abstract
The resistivity of GaP crystal changed from ∼0.5Ω-cm to ∼109Ω-cm and an original orange colour of the crystal varied to black by 1∼7 MeV electron irradiation. It is useful for isolating GaP junction devices. In the present paper, the spatial distributions of red luminescence in a linelike region irradiated by scanned electron beam with ∼32µm width were investigated using a scanning electron microscope (SEM). Also the annealing behavior and the electron energy dependence of the two-dimensional distribution profiles of damage defect density in GaP were obtained experimentally by using a microdensitometer and the theoretical profiles were estimated by a Monte Carlo simulation.
Keywords
Annealing; Conductivity; Electron beams; Electron optics; Light emitting diodes; Monte Carlo methods; Optical films; Scanning electron microscopy; Temperature; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices Meeting, 1978 International
Type
conf
DOI
10.1109/IEDM.1978.189499
Filename
1479924
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