• DocumentCode
    3554762
  • Title

    Isolation of GaP LED using electron irradiation II

  • Author

    Wada, T. ; Uemura, S. ; Kakehi, M. ; Kitamura, N.

  • Author_Institution
    Mie University, Tsu, Japan
  • Volume
    24
  • fYear
    1978
  • fDate
    1978
  • Firstpage
    638
  • Lastpage
    641
  • Abstract
    The resistivity of GaP crystal changed from ∼0.5Ω-cm to ∼109Ω-cm and an original orange colour of the crystal varied to black by 1∼7 MeV electron irradiation. It is useful for isolating GaP junction devices. In the present paper, the spatial distributions of red luminescence in a linelike region irradiated by scanned electron beam with ∼32µm width were investigated using a scanning electron microscope (SEM). Also the annealing behavior and the electron energy dependence of the two-dimensional distribution profiles of damage defect density in GaP were obtained experimentally by using a microdensitometer and the theoretical profiles were estimated by a Monte Carlo simulation.
  • Keywords
    Annealing; Conductivity; Electron beams; Electron optics; Light emitting diodes; Monte Carlo methods; Optical films; Scanning electron microscopy; Temperature; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting, 1978 International
  • Type

    conf

  • DOI
    10.1109/IEDM.1978.189499
  • Filename
    1479924