DocumentCode :
3554770
Title :
A new power transistor structure for improved switching performances
Author :
Owyang, K. ; Shafer, P.
Author_Institution :
General Electric Company, Syracuse, New York
Volume :
24
fYear :
1978
fDate :
1978
Firstpage :
667
Lastpage :
670
Abstract :
The performances of high voltage switching transistors in an inductive circuit are largely determined by the switching loss it incurred and also by the ruggedness to withstand reverse second breakdown. This paper presents an innovative emitter structure which has no adverse effect on static characteristics but provides at least three times improvement in switching loss and 10% improvement in RBSOA. It also has been demonstrated that RBSOA performance can further be enhanced drastically with the use of a multiple epitaxial layer collector structure. This coupled with the new emitter structure constitutes a new transistor structure that has low switching loss and rugged RBSOA performance.
Keywords :
Breakdown voltage; Coupling circuits; Epitaxial layers; Inverters; Power semiconductor switches; Power transistors; Semiconductor device breakdown; Semiconductor devices; Switching circuits; Switching loss;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting, 1978 International
Type :
conf
DOI :
10.1109/IEDM.1978.189507
Filename :
1479932
Link To Document :
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