DocumentCode :
3554827
Title :
Generalized guide for MOSFET miniaturization
Author :
Brews, J.R. ; Fichtner, W. ; Nicollian, E.H. ; Sze, S.M.
Author_Institution :
Bell Laboratories, Murray Hill, New Jersey
Volume :
25
fYear :
1979
fDate :
1979
Firstpage :
10
Lastpage :
13
Abstract :
As MOSFET dimensions are reduced, it is desirable to preserve long-channel MOSFET behavior. In general, lower voltages, shallower junctions, thinner oxides, and heavier doping help to maintain long-channel behavior as channel length is reduced. Our purpose here is to propose a simple, approximate relation between these parameters and the minimum channel length for which long-channel subthreshold behavior will be observed. This relation provides a simple estimate for MOSFET parameters, not requiring reduction of all dimensions by the same scale factor.
Keywords :
Computer errors; Doping; Equations; Geometry; MOSFET circuits; Oxidation; Parameter estimation; Semiconductor device modeling; Silicon; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting, 1979 Internationa
Type :
conf
DOI :
10.1109/IEDM.1979.189526
Filename :
1480391
Link To Document :
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