DocumentCode
3554835
Title
Session 3 Device technology — Dry etching and fine line techniques
Author
Hunter, W.R.
Author_Institution
Texas Instruments, Inc., Dallas, TX, USA
fYear
1979
fDate
3-5 Dec. 1979
Firstpage
43
Lastpage
43
Abstract
Start of the above-titled section of the conference proceedings.
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices Meeting, 1979 Internationa
Conference_Location
Washington, DC, USA
Type
conf
DOI
10.1109/IEDM.1979.189534
Filename
1480399
Link To Document