DocumentCode :
3554835
Title :
Session 3 Device technology — Dry etching and fine line techniques
Author :
Hunter, W.R.
Author_Institution :
Texas Instruments, Inc., Dallas, TX, USA
fYear :
1979
fDate :
3-5 Dec. 1979
Firstpage :
43
Lastpage :
43
Abstract :
Start of the above-titled section of the conference proceedings.
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting, 1979 Internationa
Conference_Location :
Washington, DC, USA
Type :
conf
DOI :
10.1109/IEDM.1979.189534
Filename :
1480399
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=3554835
