DocumentCode
3554853
Title
A new VMOS power FET
Author
Kay, Steeve ; Trieu, C.T. ; Yeh, Bing H.
Author_Institution
Siliconix Incorporated, Santa Clara, California
Volume
25
fYear
1979
fDate
1979
Firstpage
97
Lastpage
101
Abstract
This paper describes the design of a new family of VMOS power FETs exhibiting low ON resistance, high current as well as high breakdown voltage and fast switching speeds. The design which is based on a 1st-order device model, features a novel polysilicon-gate structure and a field-plated groove termination to achieve high packing density and high breakdown voltage, respectively. One device measuring 0.19 cm2realizes a w/l ratio in excess of 750,000. It can block 200 V at an ON resistance of 0.1 ohm. This chip delivers over 50 A of pulsed drain current with 10 V gate drive. Another device measuring 0.15 cm2can sustain 450 V at 8 A of pulsed drain current, withstand a slew rate (dv/dt) of over 25 V per nanosecond, and switch 5 A in 30 nanoseconds.
Keywords
Electrical resistance measurement; Electrodes; Equations; FETs; Immune system; Nanoscale devices; Pulse measurements; Semiconductor device measurement; Surface resistance; Switches;
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices Meeting, 1979 Internationa
Type
conf
DOI
10.1109/IEDM.1979.189549
Filename
1480414
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