• DocumentCode
    3554853
  • Title

    A new VMOS power FET

  • Author

    Kay, Steeve ; Trieu, C.T. ; Yeh, Bing H.

  • Author_Institution
    Siliconix Incorporated, Santa Clara, California
  • Volume
    25
  • fYear
    1979
  • fDate
    1979
  • Firstpage
    97
  • Lastpage
    101
  • Abstract
    This paper describes the design of a new family of VMOS power FETs exhibiting low ON resistance, high current as well as high breakdown voltage and fast switching speeds. The design which is based on a 1st-order device model, features a novel polysilicon-gate structure and a field-plated groove termination to achieve high packing density and high breakdown voltage, respectively. One device measuring 0.19 cm2realizes a w/l ratio in excess of 750,000. It can block 200 V at an ON resistance of 0.1 ohm. This chip delivers over 50 A of pulsed drain current with 10 V gate drive. Another device measuring 0.15 cm2can sustain 450 V at 8 A of pulsed drain current, withstand a slew rate (dv/dt) of over 25 V per nanosecond, and switch 5 A in 30 nanoseconds.
  • Keywords
    Electrical resistance measurement; Electrodes; Equations; FETs; Immune system; Nanoscale devices; Pulse measurements; Semiconductor device measurement; Surface resistance; Switches;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting, 1979 Internationa
  • Type

    conf

  • DOI
    10.1109/IEDM.1979.189549
  • Filename
    1480414