Title :
2500V, 600A gate turn-off thyristor (GTO)
Author :
Azuma, Makoto ; Takigami, Katsuhiko ; Kurata, Mamoru
Author_Institution :
Toshiba Research and Development Center, Kawasaki, Kanagawa, Japan
Abstract :
The vital point for 2500V, 600A GTO design is to establish a principle for increasing maximum gate turn-off current (IATO), while keeping overall thyristor characteristics in reasonable balance. High IATOwas attained by decreasing p-base surface resistance to below a certain limit, as well as decreasing n-emitter finger width. Excellent thyristor characteristics were obtained by adopting thick p-base layer with as low as possible acceptor concentration. From a device process point of view, introducing a new annealing process of phosphorus redeposition increased carrier lifetime in the p-base to a sufficiently high level. This process contributed most strikingly to improving the off-state voltage.
Keywords :
Annealing; Doping profiles; Fingers; Proximity effect; Research and development; Surface resistance; Surges; Testing; Thyristors; Voltage;
Conference_Titel :
Electron Devices Meeting, 1979 Internationa
DOI :
10.1109/IEDM.1979.189591