DocumentCode
3554996
Title
Photofabricated thin-film transistor arrays
Author
Wysocki, J. ; Poleshuk, M. ; Hudson, R.
Author_Institution
Xerox Corporation, Webster, New York
Volume
25
fYear
1979
fDate
1979
Firstpage
543
Lastpage
545
Abstract
Thin-film-transistor (TFT) arrays were fabricated entirely with photolithographic pattern delineation of transistor materials which were deposited sequentially in a multipump-down-mode. Classical metal shadow masks were not used. Results obtained from 1" square arrays containing 25 TFT\´s with a finest line width of 25 µm demonstrate feasibility of complete photolithographic fabrication of TFT microcircuits and drive matrices. Process options, associated advantages and disadvantages for large-area applications and device characteristics, including reproducibility and reliability, are presented.
Keywords
Additives; Displays; Fabrication; Inspection; Milling; Plasma applications; Sputtering; Strips; Substrates; Thin film transistors;
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices Meeting, 1979 Internationa
Type
conf
DOI
10.1109/IEDM.1979.189679
Filename
1480544
Link To Document