Abstract :
In this article a new concept of a single phase CCD, called "virtual phase", is described. Virtual phase technology employs only a single level gate electrode structure. This technology represents a new approach to fabrication of large area CCD devices which have both high performance and high yield. An example of the application of virtual phase technology to the fabrication of a 490 × 328 CCD imager is presented, and several important design and performance parameters are discussed.
