• DocumentCode
    3555128
  • Title

    Quarter micron gate low noise GaAsFET´s operable up to 30 GHz

  • Author

    Kamei, Kentaro ; Hori, S. ; Kawasaki, H. ; Chigira, T. ; Kawabuchi, K.

  • Author_Institution
    Toshiba Corporation, Kawasaki, Japan
  • Volume
    26
  • fYear
    1980
  • fDate
    1980
  • Firstpage
    102
  • Lastpage
    105
  • Abstract
    Quarter micron gate low noise GaAs MESFET´s have been developed by delineating gate electrodes with an electron beam lithography technique and by reducing parasitic source and gate resistances. At 18GHz, a noise figure of 1.9dB with an associated gain of 7dB and a maximum available gain of 11dB were obtained at drain currents of 10mA and 30mA, respectively. At 30GHz, a noise figure of 4dB with an associated gain of 5dB and a maximum available gain of 8dB were obtained. The measured noise figures are the best values reported so far, and this work has demonstrated the feasibility of utilizing GaAs MESFET´s up to millimeter-wave regions.
  • Keywords
    Electrodes; Electron beams; Gallium arsenide; Lithography; MESFETs; Millimeter wave measurements; Millimeter wave technology; Noise figure; Noise measurement; Noise reduction;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting, 1980 International
  • Type

    conf

  • DOI
    10.1109/IEDM.1980.189764
  • Filename
    1481207