Title :
Quarter micron gate low noise GaAsFET´s operable up to 30 GHz
Author :
Kamei, Kentaro ; Hori, S. ; Kawasaki, H. ; Chigira, T. ; Kawabuchi, K.
Author_Institution :
Toshiba Corporation, Kawasaki, Japan
Abstract :
Quarter micron gate low noise GaAs MESFET´s have been developed by delineating gate electrodes with an electron beam lithography technique and by reducing parasitic source and gate resistances. At 18GHz, a noise figure of 1.9dB with an associated gain of 7dB and a maximum available gain of 11dB were obtained at drain currents of 10mA and 30mA, respectively. At 30GHz, a noise figure of 4dB with an associated gain of 5dB and a maximum available gain of 8dB were obtained. The measured noise figures are the best values reported so far, and this work has demonstrated the feasibility of utilizing GaAs MESFET´s up to millimeter-wave regions.
Keywords :
Electrodes; Electron beams; Gallium arsenide; Lithography; MESFETs; Millimeter wave measurements; Millimeter wave technology; Noise figure; Noise measurement; Noise reduction;
Conference_Titel :
Electron Devices Meeting, 1980 International
DOI :
10.1109/IEDM.1980.189764