Title :
Session 9 Device technology — Process modeling and characterization
Author_Institution :
Fairchild, Palo Alto, CA, USA
Abstract :
Start of the above-titled section of the conference proceedings.
Conference_Titel :
Electron Devices Meeting, 1980 International
Conference_Location :
Washington, DC, USA
DOI :
10.1109/IEDM.1980.189796
