• DocumentCode
    3555178
  • Title

    Parasitic capacitance influence in micron and submicron CMOS/SOS

  • Author

    Pattanayak, D.N. ; Poksheva, J.G. ; Beguwala, M.M.

  • Author_Institution
    Rockwell International, Anaheim, California
  • Volume
    26
  • fYear
    1980
  • fDate
    1980
  • Firstpage
    260
  • Lastpage
    263
  • Abstract
    The impact of parasitic capacitance in micron and submicron CMOS/SOS implementations is explored. Relative measures of parasitic fringing and interconnect capacitance associated with ring oscillator and high-speed 1/64 frequency divider (400 MHz at 4V) circuit layouts are investigated. Parasitic capacitance figures of merit are analyzed in terms of several key geometrical dimensions, from which sensitivity of parasitic influence on circuit speed to departure from ideal scaling laws can be deduced. Analytical and numerical results and design considerations moderating deleterious effects of parasitic capacitance in down scaling from 2 to 1 to 0.5µm CMOS/SOS technologies are discussed.
  • Keywords
    CMOS technology; Capacitance measurement; Capacitors; Counting circuits; Dielectric substrates; Frequency conversion; Integrated circuit interconnections; Parasitic capacitance; Ring oscillators; Very large scale integration;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting, 1980 International
  • Type

    conf

  • DOI
    10.1109/IEDM.1980.189809
  • Filename
    1481252