DocumentCode
3555178
Title
Parasitic capacitance influence in micron and submicron CMOS/SOS
Author
Pattanayak, D.N. ; Poksheva, J.G. ; Beguwala, M.M.
Author_Institution
Rockwell International, Anaheim, California
Volume
26
fYear
1980
fDate
1980
Firstpage
260
Lastpage
263
Abstract
The impact of parasitic capacitance in micron and submicron CMOS/SOS implementations is explored. Relative measures of parasitic fringing and interconnect capacitance associated with ring oscillator and high-speed 1/64 frequency divider (400 MHz at 4V) circuit layouts are investigated. Parasitic capacitance figures of merit are analyzed in terms of several key geometrical dimensions, from which sensitivity of parasitic influence on circuit speed to departure from ideal scaling laws can be deduced. Analytical and numerical results and design considerations moderating deleterious effects of parasitic capacitance in down scaling from 2 to 1 to 0.5µm CMOS/SOS technologies are discussed.
Keywords
CMOS technology; Capacitance measurement; Capacitors; Counting circuits; Dielectric substrates; Frequency conversion; Integrated circuit interconnections; Parasitic capacitance; Ring oscillators; Very large scale integration;
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices Meeting, 1980 International
Type
conf
DOI
10.1109/IEDM.1980.189809
Filename
1481252
Link To Document