DocumentCode :
3555246
Title :
Integrated grid technology
Author :
Dohler, Gottfried H ; Rengan, A. ; Scafuri, F.
Author_Institution :
Northrop Corp., Rolling Meadows, Illinois
Volume :
26
fYear :
1980
fDate :
1980
Firstpage :
475
Lastpage :
478
Abstract :
A new concept for integrated cathode grid structures is presented. Two fine photo etched grids of similar geometry are brazed into a sandwich structure where they remain spaced and electrically isolated from each other by small dielectric posts. The fabrication and testing of structures based on this concept has required a study of insulating materials at elevated temperatures and grid emission suppression schemes, the results of which are discussed. Life test results are related to physico-chemical processes taking place in the direct environment of thermionic cathodes.
Keywords :
Cathodes; Dielectric materials; Dielectrics and electrical insulation; Etching; Fabrication; Geometry; Isolation technology; Materials testing; Sandwich structures; Space technology;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting, 1980 International
Type :
conf
DOI :
10.1109/IEDM.1980.189870
Filename :
1481313
Link To Document :
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