DocumentCode :
3555286
Title :
Techniques for optimizing statistical simulations [IC processes]
Author :
Rotella, Francis M. ; Sanders, Thomas J.
Author_Institution :
Florida Inst. of Technol., Melbourne, FL, USA
fYear :
1991
fDate :
12-14 Jun 1991
Firstpage :
122
Lastpage :
127
Abstract :
The authors address the methodology developed for the Florida SEMATECH Center of Excellence (FSCOE) for performing statistical simulations of integrated circuit processes. This methodology involves doing a series of statistical simulations at the process, device, and circuit design levels. Various techniques to improve the amount of time it takes to obtain results from statistical simulations of processes using Suprem-IV are described. Methods the design engineer can use, rather than means of improving the models in the simulator are considered. The key to this methodology is that multiple simulations are performed in order to obtained the statistical results to adequately model the effect of the variation in the fab. Five possible techniques are outlined that reduce the simulation time and eliminate the need to buy expensive computer equipment or use less accurate simulation models
Keywords :
integrated circuit technology; statistical analysis; IC fabrication; Suprem-IV; integrated circuit processes; multiple simulations; simulation models; statistical simulations; Analytical models; Circuit simulation; Design engineering; Design methodology; Integrated circuit modeling; Manufacturing processes; Oxidation; Power capacitors; Process design; Statistical analysis;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
University/Government/Industry Microelectronics Symposium, 1991. Proceedings., Ninth Biennial
Conference_Location :
Melbourne, FL
ISSN :
0749-6877
Print_ISBN :
0-7803-0109-9
Type :
conf
DOI :
10.1109/UGIM.1991.148135
Filename :
148135
Link To Document :
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