DocumentCode :
3555315
Title :
Polysilicon FET devices for large area input/output applications
Author :
Depp, S.W. ; Juliana, A. ; Huth, B.G.
Author_Institution :
International Business Machines Corporation, San Jose, California
Volume :
26
fYear :
1980
fDate :
1980
Firstpage :
703
Lastpage :
706
Abstract :
The properties of FETs made in a polysilicon semiconductor are discussed both theoretically and experimentally. A two-dimensional solution for the potential in a polysilicon grain under the influence of a transverse field produced by the gate shows that the channel mobility can be described by an activation energy which depends on the gate voltage. Calculated drain currents based on parameters derived from Hall measurements are in good agreement with actual devices. In addition, circuits such as a latch with a liquid crystal driver are described.
Keywords :
Boundary conditions; Crystalline materials; Electron traps; FETs; Grain boundaries; Insulation; Liquid crystals; Semiconductor materials; Thin film transistors; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting, 1980 International
Type :
conf
DOI :
10.1109/IEDM.1980.189933
Filename :
1481376
Link To Document :
بازگشت