DocumentCode
3555315
Title
Polysilicon FET devices for large area input/output applications
Author
Depp, S.W. ; Juliana, A. ; Huth, B.G.
Author_Institution
International Business Machines Corporation, San Jose, California
Volume
26
fYear
1980
fDate
1980
Firstpage
703
Lastpage
706
Abstract
The properties of FETs made in a polysilicon semiconductor are discussed both theoretically and experimentally. A two-dimensional solution for the potential in a polysilicon grain under the influence of a transverse field produced by the gate shows that the channel mobility can be described by an activation energy which depends on the gate voltage. Calculated drain currents based on parameters derived from Hall measurements are in good agreement with actual devices. In addition, circuits such as a latch with a liquid crystal driver are described.
Keywords
Boundary conditions; Crystalline materials; Electron traps; FETs; Grain boundaries; Insulation; Liquid crystals; Semiconductor materials; Thin film transistors; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices Meeting, 1980 International
Type
conf
DOI
10.1109/IEDM.1980.189933
Filename
1481376
Link To Document